Canon announced on July 20 that it has delivered the “FPA-1200NZ2C” semiconductor manufacturing equipment for mass production using nanoimprint technology to the Yokkaichi Plant of Toshiba Memory. This will further accelerate the development of semiconductor memory using nanoimprint technology for mass production.


Nanoimprint technology transfers the circuit pattern of a mask by pressing a mold called a mask directly against the resist on the wafer like a stamp, and it is characterized by being able to draw patterns at a lower cost than conventional light exposure equipment. ..

Nanoimprint technology can form patterns more easily than light exposure methods

Canon has positioned industrial equipment as one of the four pillars of its new business, and intends to ensure business expansion in the industrial equipment field by putting nanoimprint semiconductor manufacturing equipment into practical use.